Coated, light-transmitting or reflecting substrate, used as optical component or window, e.g. lens, mirror or windscreen, has (per)fluoroalkylsilane coating produced by plasma etching, hydration, drying and gas phase deposition
A method for the gas phase deposition of partially fluorinated or perfluorinated alkyl silanes onto a substrate in a reaction chamber includes cleaning the substrate, hydrating the substrate with steam, drying the substrate and silanization of the substrate by deposition of the alkyl silane from the gas phase. The cleaning of the substrate is a plasma etching process and the hydration occurs directly after the plasma etching.
32049440
Alternative title(s) : (de) Gasphasenabscheidung von perfluorierten alkylsilanen (fr) Depot en phase gazeuse d'alkylsilanes perfluores (en) Gas phase deposition of perfluorinated alkyl silanes
TTO:6.0365
Patent number | Country code | Kind code | Date issued |
US2005247120 | US | A1 | 2005-11-10 |
EP1554058 | EP | A1 | 2005-07-20 |
AU2003282034 | AU | A1 | 2004-05-13 |
WO2004037446 | WO | A1 | 2004-05-06 |
DE10248775 | DE | A1 | 2004-04-29 |