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conference paper
Nano-gap high quality factor thin film SOI MEM resonators
2008
NSTI Nanotech, The Nanotechnology Conference and Trade Show, 2008
A 1.25 m thin SOI micro-electro-mechanical (MEM) resonator with a quality factor of 100’000 at 24.6 MHz is demonstrated. A nanogap fabrication process allows the fabrication of < 200 nm gaps, allowing for low polarization voltages. A motional resistance of 55 k is measured at 18 V DC polarization and values still below 100 k can be measured at 14 V.
Type
conference paper
Web of Science ID
WOS:000272170200057
Authors
Publication date
2008
Published in
NSTI Nanotech, The Nanotechnology Conference and Trade Show, 2008
Peer reviewed
REVIEWED
EPFL units
Available on Infoscience
July 15, 2009
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