Photoplastic Fabrication Techniques and Devices based on High Aspect Ratio Photoresist.
2001
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Details
Title
Photoplastic Fabrication Techniques and Devices based on High Aspect Ratio Photoresist.
Author(s)
GENOLET, Grégoire
Advisor(s)
Date
2001
Publisher
Université de Neuchâtel
Note
Jury: P. Renaud (EPFL) F. Marquis-Weible (EPFL), F. Grey, Uni of Denmark), P. Vettiger, (IBM, ZH)
Laboratories
SAMLAB
Record Appears in
Scientific production and competences > STI - School of Engineering > STI Archives > SAMLAB - Sensors, Actuators and Microsystems Laboratory
Work outside EPFL
Theses
Work outside EPFL
Theses
Record creation date
2009-05-12