Development of novel SU-8 based nanoimprint lithography

We present two kinds of novel nanoimprint lithography techniques based on SU-8 photoresist with single layer and tri-layer approaches. The imprint templates with high aspect ratio were first fabricated by electron beam lithography (EBL) and reactive ion etch (RIE), and then duplicated by the SU-8/SiO2/PMMA tri-layer technique we developed. Imprint properties such as pressure and temperature are determined to fabricate different nanostructures with various imprint depth. The developed processes, which provide us the capability to fabricate both imprinted nanostructures on resist and transferred nanopatterns on substrate with high volume and low cost, are further applied in producing high density gratings, planar chiral photonic metamaterials, and nanofluidics channels.

Published in:
Proceedings of the International Conference on Solid-State and Integrated-Circuit Technology
Presented at:
The 9th International Conference on Solid-State and Integrated-Circuit Technology (ICSICT), Beijing, China, October 20-23, 2008

Note: The status of this file is: EPFL only

 Record created 2009-03-30, last modified 2018-09-13

Download fulltext

Rate this document:

Rate this document:
(Not yet reviewed)