Infoscience

Conference paper

High quality surface passivation and heterojunction fabrication by VHF-PECVD deposition of amorphous silicon on crystalline Si: theory and experiments

    Note:

    IMT-NE Number: 459, 460

    Reference

    • PV-LAB-CONF-2007-008

    Record created on 2009-02-10, modified on 2016-08-08

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