Role of i layer deposition parameters on the V0c and FF of an a-Si:H solar cell deposited by PECVD at 27.13 MHz

A study of the i-layer porosity as a function of the deposition parameters by PECVD technique, is presented here. It is demonstrated in particular, that for a fixed deposition rate of 2 Å/s, increasing the plasma power tends to increase the layer density, while increasing the pressure tends to increase the layer porosity. Regarding the cells, no correlation between the layer density and the initial cell performances is observed. On the contrary, the i-layer porosity seems to influence the cell degradation: High porosity of the i-layer leads to high degradation, which gives an easy tool to investigate the layer quality. © 2003 Elsevier B.V. All rights reserved.


Published in:
Thin Solid Films, 451-452, 250-254
Year:
2003
ISSN:
00406090
Note:
IMT-NE Number: 372
Laboratories:


Note: The status of this file is: Involved Laboratories Only


 Record created 2009-02-10, last modified 2018-03-17

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