Hydrogen Diffusion in a-Si:H Stimulated by Intense Illumination

Hydrogenated amorphous silicon (a-Si:H) films have been thermally annealed at temperatures in the range 220-270 °C for 24-48 h either under intense visible light illumination (4-16 W/cm2) or in the dark. After each annealing, the hydrogen-concentration profile was measured with Rutherford-backscattering-spectrometry and elastic-recoil-detection-analysis ion-beam analysis methods. A model is proposed which shows that, in good agreement with our results, the hydrogen-diffusion constant DH is proportional to the power of illumination and also proportional to the loosely bonded hydrogen concentration. Other consequences of the model are discussed. © 1994 The American Physical Society.


Publié dans:
Physical Review B, 50, 15, 644-648
Année
1994
ISSN:
01631829
Note:
IMT-NE Number: 182
Autres identifiants:
Scopus: 2-s2.0-0037875246
Laboratoires:




 Notice créée le 2009-02-10, modifiée le 2018-03-17


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