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  4. Crystallinity Uniformity of Microcrystalline Silicon Thin Films Deposited in Large Area Radio Frequency Capacitively-coupled Reactors
 
conference paper

Crystallinity Uniformity of Microcrystalline Silicon Thin Films Deposited in Large Area Radio Frequency Capacitively-coupled Reactors

Strahm, B.  
•
Howling, A.A.  
•
Hollenstein, Ch.  
2008
Amorphous and Polycrystalline Thin-Film Silicon Science and Technology—2008
Symposium on Amorphous and Polycrystalline Thin-Film Silicon Science and Technology held at the 2008 MRS Spring Meeting
  • Details
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Type
conference paper
DOI
10.1557/PROC-1066-A01-01
Web of Science ID

WOS:000261398700001

Author(s)
Strahm, B.  
Howling, A.A.  
Hollenstein, Ch.  
Date Issued

2008

Published in
Amorphous and Polycrystalline Thin-Film Silicon Science and Technology—2008
Series title/Series vol.

MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS; 1066

Start page

3

End page

14

Editorial or Peer reviewed

NON-REVIEWED

Written at

EPFL

EPFL units
CRPP  
SPC  
Event nameEvent placeEvent date
Symposium on Amorphous and Polycrystalline Thin-Film Silicon Science and Technology held at the 2008 MRS Spring Meeting

San Francisco, CA

March 25-28, 2008

Available on Infoscience
January 28, 2009
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/34510
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