Nanomechanical Mass Sensor for Spatially Resolved Ultrasensitive Monitoring of Deposition Rates in Stencil Lithography


Published in:
Small, 5, 176-180
Year:
2009
Publisher:
Wiley-Blackwell
ISSN:
1613-6810
Keywords:
Laboratories:


Note: The status of this file is: EPFL only


 Record created 2009-01-28, last modified 2018-03-17

n/a:
Download fulltext
PDF

Rate this document:

Rate this document:
1
2
3
 
(Not yet reviewed)