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research article

Uniformity of silicon microcrystallinity in large area RF capacitive reactors

Strahm, Benjamin  
•
Hollenstein, Christoph  
•
Howling, Alan  
2008
Progress in Photovoltaics
Type
research article
DOI
10.1002/pip.857
Web of Science ID

WOS:000261819800004

Author(s)
Strahm, Benjamin  
Hollenstein, Christoph  
Howling, Alan  
Date Issued

2008

Published in
Progress in Photovoltaics
Volume

16

Start page

687

End page

691

Subjects

microcrystalline silicon

•

large area

•

uniformity

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
CRPP  
SPC  
Available on Infoscience
December 15, 2008
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/32667