UV-curable nanoimprint resin with enhanced anti-sticking property

This paper reports on a newly developed anti-sticking resin obtained by mixing a fluorine-containing monomer (F- monomer) for UV nanoimprinting lithography (UV-NIL) to reduce the contact adhesion force during the demolding process. The new resin system shows an enhanced reliability and resolution of pattern transfer with no treatment on the surface of the quartz stamp.We fabricated various nanopatterns with F-monomer resins of various concentrations in the low pressure UV-NIL. The number of process steps of a release layer treatment for UV-NIL was reduced by using F-monomer with anti-sticking property.


Published in:
Applied Surface Science, 254, 4793-4796
Year:
2008
Laboratories:


Note: The status of this file is: EPFL only


 Record created 2008-10-08, last modified 2018-09-13

n/a:
Download fulltext
PDF

Rate this document:

Rate this document:
1
2
3
 
(Not yet reviewed)