Metallic Nanowires by Full Wafer Stencil Lithography

Aluminum and gold nanowires were fabricated using 100 mm stencil wafers containing nanoslits fabricated with a focused ion beam. The stencils were aligned and the nanowires deposited on a substrate with predefined electrical pads. The morphology and resistivity of the wires were studied. Nanowires down to 70-nm wide and 5 µm long have been achieved showing a resistivity of 10 µΩcm for Al and 5 µΩcm for Au and maximum current density of ~108 A/cm2. This proves the capability of stencil lithography for the fabrication of metallic nanowires on a full wafer scale.


Published in:
Nano Letters, 8, 11, 3675-3682
Year:
2008
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 Record created 2008-09-10, last modified 2018-12-03

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