Novel methods to pattern polymers for microfluidics

We present two novel methods for the preparation of arbitrary microscale patterns of polymers on surfaces with pre-defined topography. While photosensitive polymers are used commonly together with optical lithography, the methods presented can be used for nonphotostructurable polymers and where spin-coating cannot be performed. As demonstrator of the viability of the proposed fabrication process, they have been applied for the definition of hydrophobic barriers on a microfluidics network, which is dedicated to selectively dispense liquid to a spotting device consisting of 12 silicon microcantilevers.


Published in:
Microelectronic Engineering, 85, 972-975
Year:
2008
Publisher:
Elsevier
ISSN:
0167-9317
Laboratories:


Note: The status of this file is: EPFL only


 Record created 2008-06-25, last modified 2018-03-18

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