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research article

Improving plasma uniformity using lens-shaped electrodes in a large area very high frequency reactor

Schmidt, H.  
•
Sansonnens, L.  
•
Howling, A. A.  
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2004
Journal of Applied Physics

Experiments using a lens-shaped circular electrode are described to measure the correction of plasma nonuniformity due to the standing wave effect in a large area very high frequency plasma reactor. This work is the experimental verification of the theoretical reactor design in cylindrical geometry recently presented by L. Sansonnens and J. Schmitt, Appl. Phys. Lett. 82, 182 (2003). It is found that the lens-shaped electrode effectively compensates the standing wave effects by creating a uniform rf vertical electric field in the plasma volume. The plasma is uniform, except for edge effects, for a wide range of parameters and consequently the design is suitable for plasma processing. (C) 2004 American Institute of Physics.

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Type
research article
DOI
10.1063/1.1690096
Web of Science ID

WOS:000220875400006

Author(s)
Schmidt, H.  
Sansonnens, L.  
Howling, A. A.  
Hollenstein, C.  
Elyaakoubi, M.
Schmitt, J. P. M.
Date Issued

2004

Published in
Journal of Applied Physics
Volume

95

Issue

9

Start page

4559

End page

4564

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
CRPP  
SPC  
Available on Infoscience
April 16, 2008
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/22036
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