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research article

A gas flow uniformity study in large-area showerhead reactors for RF plasma deposition

Sansonnens, L.  
•
Howling, A. A.  
•
Hollenstein, C.  
2000
Plasma Sources Science & Technology

A simple one-dimensional model for plasma deposition in a rectangular showerhead reactor with single side pumping has been developed in order to explain the mechanisms which yield uniform deposition using this gas flow configuration. Although the flow velocity increases linearly with distance towards the pumping side, the solution of the transport equations for the neutral species shows that their number densities are constant throughout the reactor. Consequently, the plasma and surface deposition reactions are independent of position in any arbitrarily-large-area showerhead reactor.

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Type
research article
DOI
10.1088/0963-0252/9/2/314
Author(s)
Sansonnens, L.  
Howling, A. A.  
Hollenstein, C.  
Date Issued

2000

Published in
Plasma Sources Science & Technology
Volume

9

Issue

2

Start page

205

End page

209

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
CRPP  
SPC  
Available on Infoscience
April 16, 2008
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/21629
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