Nanostructured Ni3Al produced by magnetron sputtering

Intermetallic Ni3Al has been deposited by means of magnetron sputtering on substrates with an amorphous surface structure. The source was a homogeneous mixture of Ni-AI 75:25 % in the solid phase. The lateral and perpendicular grain sizes are below 20 nm. The morphology of the layer was studied by transmission electron microscopy. The hardness of a single Ni3Al layer and of a multilayered Ni3Al/Ni are measured by nanoindentation and compared with the hardness of a bulk coarse-grained polycrystalline Ni3Al.


Published in:
Nanostructured Materials, 6, 5-8, 739-742
Year:
1995
ISSN:
0965-9773
ISBN:
0965-9773
Laboratories:
SPC
CRPP




 Record created 2008-04-16, last modified 2018-09-13


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