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research article
Negative-Ion Mass-Spectra and Particulate Formation in Radio-Frequency Silane Plasma Deposition Experiments
Negative ions have been clearly identified in silane rf plasmas used for the deposition of amorphous silicon. Mass spectra were measured for monosilicon up to pentasilicon negative ion radical groups in power-modulated plasmas by means of a mass spectrometer mounted just outside the glow region. Negative ions were only observed over a limited range of power modulation frequency which corresponds to particle-free plasma conditions. The importance of negative ions regarding particulate formation is demonstrated and commented upon.
Type
research article
Web of Science ID
WOS:A1993KT41900011
Authors
Publication date
1993
Published in
Volume
62
Issue
12
Start page
1341
End page
1343
Peer reviewed
REVIEWED
Available on Infoscience
April 16, 2008
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