Loading...
research article
Bringing NoCs to 65nm
2007
Very deep submicron process technologies are ideal application fields for NoCs, which offer a promising solution to the scalability problem. This article sheds light on the benefits and challenges of Noc-Based interconnect design in nanometer CMOS. The author present experimental results from fully working 65-NM Noc Designs and a detailed scalability analysis.
Loading...
Name
IEEEMicro-2007-04378785.pdf
Access type
openaccess
Size
785.95 KB
Format
Adobe PDF
Checksum (MD5)
13c3582762930bd636892317da9bfd76