Bringing NoCs to 65nm
Very deep submicron process technologies are ideal application fields for NoCs, which offer a promising solution to the scalability problem. This article sheds light on the benefits and challenges of Noc-Based interconnect design in nanometer CMOS. The author present experimental results from fully working 65-NM Noc Designs and a detailed scalability analysis.
Record created on 2007-12-04, modified on 2016-08-08