Selective deposition of gold nanoparticles using Van der Waals interactions

Gold nanoparticles with hydrophobic surface have been deposited on a silicon substrate chemically patterned by reactive ion etching through a stencil mask and chemical vapour deposition of alkyl silanes. After deposition by dipping and adequate rinsing, the density of nanoparticles was found twice higher on the chemical patterns due to a difference of solvent affinity between patterned and bare silica.


Published in:
physica status solidi (c), 4, 2, 276– 278
Year:
2007
Laboratories:


Note: The status of this file is: EPFL only


 Record created 2007-09-14, last modified 2018-01-28

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