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  4. Comparison of the Lateral Carrier Transport between a Gaas Single-Quantum-Well and the Algaas Barrier During Cathodoluminescence Excitation
 
research article

Comparison of the Lateral Carrier Transport between a Gaas Single-Quantum-Well and the Algaas Barrier During Cathodoluminescence Excitation

Araujo, D.
•
Oelgart, G.
•
Ganiere, J. D.  
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1994
Journal of Applied Physics

In a recent paper we measured the lateral hole diffusion in a GaAs/AlGaAs single quantum well (SQW) by a novel method. At helium temperature, we estimate a lateral hole diffusion length in the QW of 1.5 mum. However, the assumption that diffusion takes place mainly in the, SQW needs to be checked, as the measured diffusion length is the result of two competing processes: (i) hole diffusion in the SQW plane itself and (ii) hole diffusion in the barrier followed by recombination in the SQW. We present here a comparison between the lateral hole distribution in the SQW and in the AlGaAs barrier. First, we estimate the hole diffusion length in the barrier fitting experimental cathodoluminescence linescans on simulated ones. Second, using the measured diffusion lengths in the QW plane and in the bulk barrier and modeling the carrier transport, we deduce the lateral hole distribution in both layers. It is found that even for very large barriers (1.2 mum), the hole diffusion in the barrier contributes less than 0.1% of the total lateral hole diffusion. The lateral transport is mainly carried by holes in the QW (2D diffusion) due to their confinement in the well.

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Type
research article
DOI
10.1063/1.357151
Web of Science ID

WOS:A1994NW31800049

Author(s)
Araujo, D.
Oelgart, G.
Ganiere, J. D.  
Reinhart, F. K.
Date Issued

1994

Published in
Journal of Applied Physics
Volume

76

Issue

1

Start page

342

End page

346

Subjects

INTERFACE ROUGHNESS SCATTERING

Note

Univ leipzig,fachbereich phys,o-7010 leipzig,germany. ecole polytech fed lausanne,inst micro & optoelectr,ch-1015 lausanne,switzerland. Araujo, d, univ cadiz,dept ciencia mat & im & qi,apartado 40,e-11510 puerto real,spain.

ISI Document Delivery No.: NW318

Cited Reference Count: 14

Cited References:

ARAUJO D, 1993, APPL PHYS LETT, V62, P292

ARAUJO D, 1993, J APPL PHYS, V74, P1997

BERZ F, 1976, SOLID ST ELECTRON, V19, P437

BIMBERG D, 1987, J VAC SCI TECHNOL B, V5, P1191

BRESSE JF, 1982, SCANNING ELECTRON MI, V4, P1487

GOTTINGER R, 1988, EUROPHYS LETT, V6, P183

GUILLEMOT C, 1987, PHYS REV B, V35, P2799

HATTORI K, 1987, APPL PHYS LETT, V51, P1259

HILLMER H, 1988, APPL PHYS LETT, V53, P1937

HOPFEL RA, 1988, PHYS REV B, V37, P6941

OELGART G, 1984, PHYS STATUS SOLIDI A, V85, P205

OELGART G, 1992, J APPL PHYS, V71, P1552

SAKAKI H, 1987, APPL PHYS LETT, V51, P1934

ZAREM HA, 1989, APPL PHYS LETT, V55, P1647

Editorial or Peer reviewed

REVIEWED

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Available on Infoscience
August 31, 2007
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/11108
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