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  4. Zinc Diffusion in Gaas and Zinc-Induced Disordering of Gaas Algaas Multiple Quantum-Wells - a Multitechnique Study
 
research article

Zinc Diffusion in Gaas and Zinc-Induced Disordering of Gaas Algaas Multiple Quantum-Wells - a Multitechnique Study

Pavesi, L.
•
Araujo, D.
•
Nguyen, H. K. Y.
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1991
Optical and Quantum Electronics

A review of experimental results obtained by different techniques is presented on the problem of zinc diffusion. Zinc diffusion was carried out on Si-doped GaAs (n almost-equal-to 10(18) cm-3) and on multiple quantum well (MQW) structures. The samples were investigated by secondary-ion mass spectroscopy (SIMS), different imaging modes of scanning electron microscopy such as secondary electrons, cathodoluminescence (CL) and electron beam-induced current (EBIC), transmission electron microscopy on a wedge-shaped specimen (WTEM) and by photoluminescence (PL). A nonexponential decay of the low-temperature EBIC signal accompanied by a very low CL signal due to the high density of nonradiative recombination centres were observed in the diffused region of the n-doped GaAs. Indeed, PL measurements demonstrate that Ga vacancies play a key role on the mechanism of the Zn diffusion. On the impurity-induced disordered (IID) MQW samples, an enrichment of Al at the surface was observed by SIMS and confirmed by WTEM and PL. Low-temperature PL spectra show the gradual disappearance of the MQW excitonic transitions as the number of disordered layers increases. When all of the MQW structure is destroyed, the band-to-band recombinations in the IID produced alloy dominate the PL spectrum.

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Type
research article
DOI
10.1007/BF00624970
Web of Science ID

WOS:A1991GD23900003

Author(s)
Pavesi, L.
Araujo, D.
Nguyen, H. K. Y.
Ganiere, J. D.  
Reinhart, F. K.
Buffat, PA  
Burri, G.
Date Issued

1991

Published in
Optical and Quantum Electronics
Volume

23

Issue

7

Start page

S789

End page

S804

Subjects

ELECTRON-MICROSCOPY

•

IMPURITY DIFFUSION

•

PHOTOLUMINESCENCE

•

HETEROSTRUCTURES

•

INTERDIFFUSION

•

VACANCIES

•

MODEL

Note

Swiss fed inst technol,inst micro & optoelectr,ch-1015 lausanne,switzerland. swiss fed inst technol,inst electron microscopy,ch-1015 lausanne,switzerland. univ lausanne,inst exptl phys,ch-1015 lausanne,switzerland.

ISI Document Delivery No.: GD239

Cited Reference Count: 30

Cited References:

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Editorial or Peer reviewed

REVIEWED

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Available on Infoscience
August 31, 2007
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/11019
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