Improved and new properties of resist materials by doping with nanoparticles and nanocrystals
Increasing interest in specific applications in the field of micro- and nano-electromechanical systems (MEMS and NEMS) has raised the request for new functional polymeric materials. Epoxy based photoresists are being broadly used for the fabrication of micromechanical devices and for the definition of patterns with high aspect ratio in the micrometer scale. SU-8, the well known thick photo resist with superior lithographic properties over a wide range of thicknesses, have made a tremendous impact on the development in this field by simple fabrication of permanent plastics elements with vertical sidewalls and a high aspect ratio. For new low cost applications organic materials are required which can be patterned and exhibit properties comparable to inorganic materials, such as high hardness, magnetism, conductivity or luminescence. For the manufacture of polymer waveguide systems materials with comparable lithographic processing but with sufficient difference in the refractive index are required. Hybrid materials consisting of inorganic nanoparticles in polymer matrices represent a novel class of materials for nano patterning with unique properties, which arise from the synergism between the properties of both components. The resulting novel materials can be processed and patterned using established techniques whereas the incorporated nanoparticles and nanocrystals convey their inherent functionalities and properties to the final material or composites. The suitability of silica epoxy photosensitive material as cladding material for waveguiding application and luminescent nanocrystal doped epoxy resist as model composite for the investigations of different core/ shell surface modifying methods and for light sensing and emitting application will be demonstrated.
Record created on 2007-03-14, modified on 2016-08-08