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conference poster not in proceedings
90 MHz nanomechanical structures fabricated by stencil deposition and dry etching
2003
We present a simple method for fabricating nanomechanical elements with ultra high resonance frequency. The process is based on local deposition through a miniaturized shadow mask (nanostencil), followed by dry etching to release the structure from the substrate. The resonance frequency of a fabricated Al/SiN nanomechanical structure has been measured using a hetrodyne doppler interferometer to be up to 90 MHz. This resistless and dry process provides a flexible, rapid and stiction-free approach for the fabrication of high frequency resonating elements in various materials.
Type
conference poster not in proceedings
Authors
Publication date
2003
EPFL units
Event name | Event place | Event date |
Boston, USA | 8-12 June, 2003 | |
Available on Infoscience
March 2, 2007
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