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research article
Oxygen impurity effects on the formation of thin titanium silicide films by rapid thermal annealing
Type
research article
Web of Science ID
WOS:A1990DU13800013
Authors
Publication date
1990
Published in
Volume
23
Issue
8
Start page
1076
End page
1081
Peer reviewed
REVIEWED
EPFL units
Available on Infoscience
February 15, 2007
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