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  4. High resolution electron microscopy of ion implanted and annealed silicon
 
conference paper

High resolution electron microscopy of ion implanted and annealed silicon

Ruterana, P
•
Stadelmann, PA  
•
Buffat, PA  
Cullis, AG
•
Hutchinson, JL
1989
Microscopy of Semiconducting Materials. Proceedings of the Royal Microscopical Society Conference
Royal Microscopical Society Conference
  • Details
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Type
conference paper
Author(s)
Ruterana, P
Stadelmann, PA  
Buffat, PA  
Editors
Cullis, AG
•
Hutchinson, JL
Date Issued

1989

Published in
Microscopy of Semiconducting Materials. Proceedings of the Royal Microscopical Society Conference
ISBN of the book

0-85498-056-3

Series title/Series vol.

Institute of Physics Conference Series; 100

Start page

39

End page

44

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
CIME  
Event nameEvent placeEvent date
Royal Microscopical Society Conference

Oxford University

10-13 April 1989

Available on Infoscience
February 15, 2007
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/2685
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