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research article

Atomic layer deposition of TiO2 for stabilization of Pt nanoparticle oxygen reduction reaction catalysts

McNeary, W. Wilson
•
Linico, Audrey E.
•
Ngo, Chilan
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2018
Journal of Applied Electrochemistry

Atomic layer deposition (ALD) was used to modify two different types of carbon black-based Pt oxygen reduction catalysts with protective TiO2 nanostructures to increase catalyst durability. Rates of ALD growth and the structure of deposited TiO2 were observed to be highly dependent on oxygen content of the catalyst substrate. Electrochemical durability was enhanced with the addition of TiO2 ALD nanostructures, with up to 70% retention in mass activity measured over accelerated durability testing. High-temperature treatment of the top-performing ALD catalyst, which was found to promote structural rearrangement of the TiO2 and Pt phases into hybrid nanoparticles, yielded a twofold increase in activity but was detrimental to durability.

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Type
research article
DOI
10.1007/s10800-018-1226-y
Author(s)
McNeary, W. Wilson
•
Linico, Audrey E.
•
Ngo, Chilan
•
van Rooij, Sarah  
•
Haussener, Sophia  
•
Maguire, Megan E.
•
Pylypenko, Svitlana
•
Weimer, Alan W.
Date Issued

2018

Published in
Journal of Applied Electrochemistry
Volume

48

Issue

9

Start page

973

End page

984

Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LRESE  
Available on Infoscience
August 10, 2018
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/147689
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