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research article

Growth parameters and shape specific synthesis of silicon nanowires by the VLS method

Latu-Romain, L.
•
Mouchet, C.
•
Cayron, C.  
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2008
Journal of Nanoparticle Research

In this paper the effect of varying temperature, pressure and chemical precursors on the vapour-liquid-solid (VLS) growth of silicon nanowires (Si NWs) have been investigated. Some aspects of nucleation and growth mechanisms are discussed. Control on Si NW morphology by varying the choice of gaseous precursor (silane or dichlorosilane) at elevated temperatures is reported. © 2008 Springer Science+Business Media B.V.

  • Details
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Type
research article
DOI
10.1007/s11051-007-9350-3
Author(s)
Latu-Romain, L.
Mouchet, C.
Cayron, C.  
Rouviere, E.
Simonato, J.-P.
Date Issued

2008

Published in
Journal of Nanoparticle Research
Volume

10

Start page

1287

End page

1291

Subjects

article

•

Business media

•

Chemical precursors

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chemical reaction

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Dichlorosilane (DCS)

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Electric wire

•

Elevated temperatures

•

Epitaxial growth

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Gas precursor

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Growth parameters

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High temperature

•

molecular electronics

•

Nanostructured materials

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Nanostructures

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nanowire

•

Nanowires

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Nonmetals

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Nucleation and growth mechanisms

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particle size

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pressure

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priority journal

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semiconductor

•

Shape control

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silane derivative

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Silanes

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Silicon

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Silicon nanowires

•

Silicon nanowires (SiNWs)

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solid lipid nanoparticle

•

Surrounding environment

•

Synthesis

•

temperature

•

Varying temperature

•

VLS methods

Editorial or Peer reviewed

REVIEWED

Written at

OTHER

EPFL units
LMTM  
Available on Infoscience
November 14, 2014
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/108858
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