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research article

Scanning spot metrology for testing of photolithographic masks

Blattner, P.
•
Herzig, H. P.  
•
Naqvi, S.S.H.
1995
Optical Engineering
  • Details
  • Metrics
Type
research article
DOI
10.1117/12.205667
Author(s)
Blattner, P.
Herzig, H. P.  
Naqvi, S.S.H.
Date Issued

1995

Published in
Optical Engineering
Volume

34

Start page

2425

End page

2427

Editorial or Peer reviewed

REVIEWED

Written at

OTHER

EPFL units
OPT  
Available on Infoscience
April 22, 2009
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/37652
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