patent

Stencil mask for accurate pattern replication

Brugger, Juergen  
•
Doeswijk, Lianne
•
Van, Den
2007

The stencil mask diminishes thermal effects on alignment between stencil and substrate, and reduces the overall presence of a gap between stencil and substrate. In addition, this design allows for easy interchange of stencils, making local alterations of stencil apertures possible without the necessity for the fabrication of a completely new stencil.

Cite this item

Brugger, J., Doeswijk, L., & Van, D. (2007). Stencil mask for accurate pattern replication (Patent No. WO2007099518). https://infoscience.epfl.ch/handle/20.500.14299/118305

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Type
patent
EPO Family ID

38180139

Author(s)
Brugger, Juergen  
Doeswijk, Lianne
Van, Den
Note

Alternative title(s) : (fr) Masque stencil destiné à une reproduction précise de motif

TTO classification

TTO:6.0616

EPFL units
LMIS1  
TTO  
IdentifierCountry codeKind codeDate issued

WO2007099518

WO

A1

2007-09-07

Available on Infoscience
September 22, 2015
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/118305