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research article

Prediction of Self-Assembled Dewetted Nanostructures for Photonics Applications via a Continuum-Mechanics Framework

Martin-Monier, Louis Marie Philippe  
•
Ledda, Pier Giuseppe  
•
Piveteau, Pierre-Luc Eloi  
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September 14, 2021
Physical Review Applied

When a liquid film lies on a nonwettable substrate, the configuration is unstable, and the film spontaneously ruptures to form droplets. This phenomenon, known as dewetting, commonly leads to undesirable morphological changes. Nevertheless, recent works, combining spontaneous dewetting triggered by thermal annealing and topographic pattern-directed dewetting, demonstrate the possibility of harnessing dewetting with a degree of precision on par with that of advanced lithographic processes for high-performance nanophotonic applications. Since resonant behavior is highly sensitive to geometrical changes, predicting quantitatively dewetting dynamics is of high interest. Here, we develop a continuum model that predicts the evolution of a thin film on a patterned substrate, from the initial reflow to the nucleation and growth of holes. We provide an operative framework based on macroscopic measurements to model the intermolecular interactions at the origin of the dewetting process, involving length scales that span from sub-nanometer to micrometer. A comparison of experimental and simulated results shows that the model can accurately predict the final distributions, thereby offering predictive tools to tailor the optical response of dewetted nanostructures.

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Type
research article
DOI
10.1103/PhysRevApplied.16.034025
Author(s)
Martin-Monier, Louis Marie Philippe  
Ledda, Pier Giuseppe  
Piveteau, Pierre-Luc Eloi  
Gallaire, François  
Sorin, Fabien  
Date Issued

2021-09-14

Publisher

American Physical Society (APS)

Published in
Physical Review Applied
Volume

3

Issue

16

Article Number

034025

Editorial or Peer reviewed

REVIEWED

Written at

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Available on Infoscience
October 5, 2021
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/181875
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