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research article

Self-aligned nanolithography by selective polymer dissolution

Zhang, Huijuan
•
Wong, Chee-Leong
•
Hao, Yufeng
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2010
Nanoscale

We report a novel approach to the fabrication of self-aligned nanoscale trench structures in a thin polymer layer covering on conductive materials. By passing AC current through a polymer-coated nanowire in the presence of an appropriate solvent, a self-aligned nanotrench is formed in the polymer overlayer as a result of accelerated dissolution while the rest of the device remains covered. Similar results have been achieved for polymer-coated graphene ribbons. Such polymer-protected devices in which only the active component is exposed should find important applications as electrical sensors in aqueous solutions, particularly in cases where parasitic ionic currents often obscure sensing signals.

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Type
research article
DOI
10.1039/c0nr00398k
Author(s)
Zhang, Huijuan
Wong, Chee-Leong
Hao, Yufeng
Wang, Rui
Liu, Xiaogang
Stellacci, Francesco  
Thong, John T. L.
Date Issued

2010

Published in
Nanoscale
Volume

2

Issue

10

Article Number

2302

Subjects

NANOPARTICLE PROBES

•

DNA

•

GRAPHENE

•

SURFACE

•

LITHOGRAPHY

•

MOLECULES

•

SENSORS

Editorial or Peer reviewed

REVIEWED

Written at

OTHER

EPFL units
SUNMIL  
Available on Infoscience
June 6, 2011
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/68449
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