Boron doped diamond films have been deposited by large area hot-filament CVD (HFCVD) on silicon, silicon carbide, and different industrial electrode materials, like niobium, tantalum, titanium, tungsten, zirconium, and graphite on areas up to 40 cm * 60 cm. These diamond electrodes have been characterized with regard to their material and electrochem. properties. The oxidn. of org. compds. has been studied using alcs., org. acids and halogenated arom. mols. These org. model mols. are oxidized to CO2 without major amts. of other detectable byproducts even at very low concns. (< 3 ppm). Concd. (1 M) and dild. (3.1 * 10-4 M) cyanide solns. have been oxidized on diamond electrodes both in the presence and in the absence of chloride ions. At low concns., the oxidn. process is strongly catalyzed by the presence of Cl-. These exptl. data demonstrate the applicability of diamond electrodes for industrial processes of wastewater treatment. [on SciFinder (R)]