The invention concerns a method and a device wherein a stencil is provided with an integrated microhotplate on the stencil membrane to prevent aperture clogging, whereby the stencil can be locally heated up in order to minimize material condensation, remove clogging and control the resolution of the deposited material by deforming the membrane towards or away from a substrate.
Type
patent
EPO Family ID
46508121
Author(s)
Note
Alternative title(s) : (fr) Lithographie à stencil dynamique auto-nettoyante in situ à base de micro-élément chauffant (en) Microheater-based in situ self-cleaning dynamic stencil lithography
TTO classification
TTO:6.1074
| Identifier | Country code | Kind code | Date issued |
WO2012164546 | WO | A3 | 2013-01-24 |
WO2012164546 | WO | A2 | 2012-12-06 |
Available on Infoscience
September 22, 2015
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