Structured ZnO-based contacts deposited by non-reactive rf magnetron sputtering on ultra-thin SiO2/Si through a stencil mask
In this paper, we study the localized deposition of ZnO micro and nanostructures deposited by non-reactive rf-magnetron sputtering through a stencil mask on ultra-thin (10 nm) SiO2 layers containing a single plane of silicon nanocrystals (NCs), synthetized by ultra-low energy ion implantation followed by thermal annealing. The localized ZnO-deposited areas are reproducing the exact stencil mask patterns. A resistivity of around 5×10−3 Ω cm is measured on ZnO layer. The as-deposited ZnO material is 97% transparent above the wavelength at 400 nm. ZnO nanostructures can thus be used as transparent electrodes for Si NCs embedded in the gate-oxide of MOS devices.
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Bernabé, A., Lalanne, M., Presmanes, L., Soon, J. M., Tailhades, Ph., Dumas, C., Grisolia, J., Arbouet, A., Paillard, V., BenAssayag, G., van den Boogaart, M. A. F., Savu, V., Brugger, J., & Normand, P. (2009). Structured ZnO-based contacts deposited by non-reactive rf magnetron sputtering on ultra-thin SiO2/Si through a stencil mask. Thin Solid Films, 518(4), 1044–1047. https://doi.org/10.1016/j.tsf.2009.03.232
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