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research article

Two dimensional quantum mechanical simulation of low dimensional tunneling devices

Alper, C.
•
Palestri, P.
•
Lattanzio, L.  
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2015
Solid-State Electronics

We present a 2-D quantum mechanical simulation framework based on self-consistent solutions of the Schrodinger and Poisson equations, using the Finite Element Method followed by tunneling current (direct and phonon assisted) calculation in post-processing. The quantum mechanical model is applied to Germanium electron hole bilayer tunnel FETs (EHBTFET). It is found that 2D direct tunneling through the underlap regions may degrade the subthreshold characteristic of such devices and requires careful device optimization to make the tunneling in the overlap region dominate over the parasitic paths. It is found that OFF and ON state currents for the EHBTFET can be classified as point and line tunneling respectively. Oxide thickness was found to have little impact on the magnitude of the ON current, whereas it impacts the OFF current. (C) 2015 Elsevier Ltd. All rights reserved.

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Type
research article
DOI
10.1016/j.sse.2015.05.030
Web of Science ID

WOS:000359170600027

Author(s)
Alper, C.
Palestri, P.
Lattanzio, L.  
Padilla, J.L.
Ionescu, A.M.  
Date Issued

2015

Publisher

Elsevier

Published in
Solid-State Electronics
Volume

113

Start page

167

End page

172

Subjects

Tunnel Field-Effect Transistor (TFET)

•

Quantum mechanical simulation

•

Finite element simulation

•

Electron Hole Bilayer TFET (EHBTFET)

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
NANOLAB  
Available on Infoscience
June 15, 2015
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/115117
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