The possibilities of sub-micron patterning by means of microstencils using pulsed laser deposition were investigated. Stencils with circular and elliptical patterns were used, with pore sizes ranging from 1 mum down to 500 nm. Strontium titanate (SrTiO3), silicon (Si) and self-assembled monolayers on gold were used as substrate materials, whereas nickel (Ni), nickel oxide (NiO) and gold (Au) have been deposited. The results show that the chosen deposition setup makes an easy and fast way for high-quality pattern creation.