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  4. Pulsed Laser and Atomic Layer Deposition of CMOS-Compatible Vanadium Dioxide: Enabling Ultrathin Phase-Change Films
 
research article

Pulsed Laser and Atomic Layer Deposition of CMOS-Compatible Vanadium Dioxide: Enabling Ultrathin Phase-Change Films

Varini, Anna  
•
Masserey, Cyrille  
•
Conti, Vanessa  
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July 2, 2025
ACS Applied Electronic Materials
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Type
research article
DOI
10.1021/acsaelm.5c01132
Author(s)
Varini, Anna  

École Polytechnique Fédérale de Lausanne

Masserey, Cyrille  

École Polytechnique Fédérale de Lausanne

Conti, Vanessa  

École Polytechnique Fédérale de Lausanne

Saadat Somaehsofla, Zahra  

École Polytechnique Fédérale de Lausanne

Ansari, Ehsan  

École Polytechnique Fédérale de Lausanne

Stolichnov, Igor  

École Polytechnique Fédérale de Lausanne

Ionescu, Adrian M.  

École Polytechnique Fédérale de Lausanne

Date Issued

2025-07-02

Publisher

American Chemical Society (ACS)

Published in
ACS Applied Electronic Materials
Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
NANOLAB  
FunderFunding(s)Grant NumberGrant URL

European Research Council

101119062

Schweizerischer Nationalfonds zur Förderung der Wissenschaftlichen Forschung

200021_208233,CRSII5_209454

Available on Infoscience
July 4, 2025
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/251915
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