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  4. Tunnel-FET architecture with improved performance due to enhanced gate modulation of the tunneling barrier
 
conference paper

Tunnel-FET architecture with improved performance due to enhanced gate modulation of the tunneling barrier

De Michielis, L.  
•
Lattanzio, L.  
•
Palestri, P.
Show more
2011
69th Device Research Conference
2011 69th Annual Device Research Conference (DRC)

The Tunnel-FET (TFET) device is a gated reverse biased p-i-n junction whose working principle is based on the quantum mechanical Band-to-Band Tunneling (B2BT) mechanism [1]. The OFF-ON transition can be much more abrupt than for conventional MOSFETs, thus allowing a reduction of the supply voltage and power consumption in logic applications [2]. Several TFETs with point Subthreshold Swing (SS) lower than 60mV/dec have been experimentally demonstrated with different architectures as conventional single gate Silicon-on-Insulator (SOI), Double Gate (DG) and Gate-All-Around (GAA) [3,4]. Unfortunately in all cases a relatively large average SS and a poor on-current have been observed. © 2011 IEEE.

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Type
conference paper
DOI
10.1109/DRC.2011.5994440
Author(s)
De Michielis, L.  
Lattanzio, L.  
Palestri, P.
Selmi, L.
Ionescu, A. M.  
Date Issued

2011

Publisher

IEEE

Published in
69th Device Research Conference
Start page

111

End page

112

Subjects

FP7 STEEPER

•

Tunnel FET

•

TFET

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
NANOLAB  
Event nameEvent placeEvent date
2011 69th Annual Device Research Conference (DRC)

Santa Barbara, CA, USA

June 20-22, 2011

Available on Infoscience
January 19, 2012
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/76784
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