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research article

Patterned thick photoresist layers for protection of protruding structures during wet and dry etching processes

Indermühle, P.-F.
•
Roth, S.
•
Dellmann, L.
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1998
Journal of Micromechanics and Microengineering
  • Details
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Type
research article
DOI
10.1088/0960-1317/8/2/007
Author(s)
Indermühle, P.-F.
•
Roth, S.
•
Dellmann, L.
•
de Rooij, N. F.  
Date Issued

1998

Published in
Journal of Micromechanics and Microengineering
Volume

8

Issue

2

Start page

74

End page

76

Note

190

Peer reviewed

REVIEWED

Written at

OTHER

EPFL units
SAMLAB  
Available on Infoscience
May 12, 2009
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/39427
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