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  4. Analysis of electromigration voiding phenomena in Cu interconnects
 
conference paper not in proceedings

Analysis of electromigration voiding phenomena in Cu interconnects

Arnaud, L.
•
Guillaumond, J.F.
•
Claret, N.
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2006
44th Annual IEEE International Reliability Physics Symposium, IRPS 2006
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Type
conference paper not in proceedings
DOI
10.1109/RELPHY.2006.251319
Author(s)
Arnaud, L.
Guillaumond, J.F.
Claret, N.
Cayron, C.  
Guedj, C.
Dupeux, M.
Arnal, V.
Reimbold, G.
Passemard, G.
Torres, J.
Date Issued

2006

Editorial or Peer reviewed

REVIEWED

Written at

OTHER

EPFL units
LMTM  
Event nameEvent date
44th Annual IEEE International Reliability Physics Symposium, IRPS 2006

2006

Available on Infoscience
November 14, 2014
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/108867
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