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research article

A compact and low loss Y-junction for submicron silicon waveguide

Zhang, Yi
•
Yang, Shuyu
•
Lim, Andy Eu-Jin
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2013
Optics Express

We designed a compact, low-loss and wavelength insensitive Y-junction for submicron silicon waveguide using finite difference time-domain (FDTD) simulation and particle swarm optimization (PSO), and fabricated the device in a 248 nm complementary metal-oxide-semiconductor (CMOS) compatible process. Measured average insertion loss is 0.28 ± 0.02 dB, uniform across an 8-inch wafer. The device footprint is less than 1.2 μm x 2 μm, an order of magnitude smaller than typical multimode interferometers (MMIs) and directional couplers.

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Type
research article
DOI
10.1364/OE.21.001310
Author(s)
Zhang, Yi
Yang, Shuyu
Lim, Andy Eu-Jin
Lo, Guo-Qiang
Galland, Christophe  
Baehr-Jones, Tom
Hochberg, Michael
Date Issued

2013

Publisher

Optical Society of America

Published in
Optics Express
Volume

21

Issue

1

Article Number

1310

Editorial or Peer reviewed

REVIEWED

Written at

OTHER

EPFL units
GR-GA  
Available on Infoscience
December 1, 2017
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/142418
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