Repository logo

Infoscience

  • English
  • French
Log In
Logo EPFL, École polytechnique fédérale de Lausanne

Infoscience

  • English
  • French
Log In
  1. Home
  2. Academic and Research Output
  3. Journal articles
  4. Experimental confirmation of temperature dependent negative capacitance in ferroelectric field effect transistor
 
research article

Experimental confirmation of temperature dependent negative capacitance in ferroelectric field effect transistor

Salvatore, Giovanni A.  
•
Rusu, Alexandru  
•
Ionescu, Adrian M.  
2012
Applied Physics Letters

In this paper, we report the basic design conditions and the experimental confirmation of a temperature dependent negative capacitance (NC) effect in a ferroelectric field-effect-transistor (Fe-FET). We find that the internal voltage amplification peaks of a metal-ferroelectric-metal-insulator-semiconductor (MFMIS) structure are correlated with the S-shape of the polarization versus electrical field characteristics. The internal voltage amplification is responsible for the subthreshold swing reduction in a Fe-FET; this effect cancels out when the temperature is increased close to the Curie temperature because of the narrowing of the NC region and because of the saturation of the amplification. A counter-clockwise rotation of the P-V loops with an associated increase of the dP/dV slope with the temperature is reported, which corresponds to an increase of the overall ferroelectric capacitance with the temperature. Finally, we theoretically and experimentally demonstrate that an optimum temperature exists at which the amplification gets its maximum. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4704179]

  • Details
  • Metrics
Type
research article
DOI
10.1063/1.4704179
Web of Science ID

WOS:000303128500072

Author(s)
Salvatore, Giovanni A.  
Rusu, Alexandru  
Ionescu, Adrian M.  
Date Issued

2012

Publisher

American Institute of Physics

Published in
Applied Physics Letters
Volume

100

Issue

16

Article Number

163504

Subjects

capacitance

•

Curie temperature

•

ferroelectric devices

•

field effect transistors

•

Misfet

•

Voltage Amplification

•

Gate

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
NANOLAB  
Available on Infoscience
June 1, 2012
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/81250
Logo EPFL, École polytechnique fédérale de Lausanne
  • Contact
  • infoscience@epfl.ch

  • Follow us on Facebook
  • Follow us on Instagram
  • Follow us on LinkedIn
  • Follow us on X
  • Follow us on Youtube
AccessibilityLegal noticePrivacy policyCookie settingsEnd User AgreementGet helpFeedback

Infoscience is a service managed and provided by the Library and IT Services of EPFL. © EPFL, tous droits réservés