International workshop on device technology : Alternatives to SiO2 as Gate Dielectric for Future Si-Based Microelectronics
Event date
September 3-5, 2001
Location
Porto Alegre, Brazil
results
International workshop on device technology : Alternatives to SiO2 as Gate Dielectric for Future Si-Based Microelectronics
September 3-5, 2001
Porto Alegre, Brazil