conference paper
Lateral error reduction in the 3D characterization of deep MOEMS devices using white light interference microscopy
2004
Optical Micro- and Nanometrology in Manufacturing Technology
Type
conference paper
Author(s)
Date Issued
2004
Published in
Optical Micro- and Nanometrology in Manufacturing Technology
Series title/Series vol.
Proc. SPIE; 5458
Start page
34
End page
42
Written at
OTHER
EPFL units
Available on Infoscience
April 22, 2009
Use this identifier to reference this record