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  4. Lowering motional resistance by partially HfO2 gap filling in double-ended tuning fork MEMS resonators.
 
conference paper

Lowering motional resistance by partially HfO2 gap filling in double-ended tuning fork MEMS resonators.

Lopez, Mariazel Maqueda
•
Casu, Emanuele A.
•
Ionescu, Adrian M.  
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2017
2017 Joint Conference of the European Frequency and Time Forum and IEEE International Frequency Control Symposium (EFTF/IFC)
2017 Joint Conference of the European Frequency and Time Forum and IEEE International Frequency Control Symposium ((EFTF/IFC)
  • Details
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Type
conference paper
DOI
10.1109/FCS.2017.8089040
Author(s)
Lopez, Mariazel Maqueda
•
Casu, Emanuele A.
•
Ionescu, Adrian M.  
•
Fernandez-Bolanos, Montserrat
Date Issued

2017

Publisher

IEEE

Published in
2017 Joint Conference of the European Frequency and Time Forum and IEEE International Frequency Control Symposium (EFTF/IFC)
Start page

805

End page

806

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
NANOLAB  
Event nameEvent placeEvent date
2017 Joint Conference of the European Frequency and Time Forum and IEEE International Frequency Control Symposium ((EFTF/IFC)

BESANÇON, France

9-13 July 2017

Available on Infoscience
November 17, 2017
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/142203
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