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  4. Fabrication and performance of 1.3-mu m 10-Gb/s CWDM wafer-fused VCSELs grown by MOVPE
 
research article

Fabrication and performance of 1.3-mu m 10-Gb/s CWDM wafer-fused VCSELs grown by MOVPE

Mereuta, A.  
•
Sirbu, A.  
•
Caliman, A.  
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2015
Journal Of Crystal Growth

Recent progress in the fabrication and performance of 1.3-mu m 10-Gb/s, low power consumption wafer-fused VCSELs grown by MOVPE under nitrogen atmosphere are presented and discussed. By optimization of the growth conditions and implementation of a cavity adjustment technique, the wavelength yield was increased to up to 70% for all four coarse wavelength division multiplexing (CWDM) channels implemented. It was demonstrated that single-mode devices can have threshold and operation currents below 1 and 7 mA, respectively, in the full 0-80 degrees C temperature range. The reproducibility of the fabrication process and prospects for enhancing performance and yield of such VCSELs are also discussed. (C) 2014 Elsevier B.V. All rights reserved.

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Type
research article
DOI
10.1016/j.jcrysgro.2014.11.012
Web of Science ID

WOS:000349602900039

Author(s)
Mereuta, A.  
Sirbu, A.  
Caliman, A.  
Suruceanu, G.  
Iakovlev, V.  
Mickvic, Z.  
Kapon, E.  
Date Issued

2015

Publisher

Elsevier Science Bv

Published in
Journal Of Crystal Growth
Volume

414

Start page

210

End page

214

Subjects

MOVPE

•

Tunnel junction

•

Vertical cavity surface emitting laser (VCSEL)

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LPN  
Available on Infoscience
May 29, 2015
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/114427
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