Repository logo

Infoscience

  • English
  • French
Log In
Logo EPFL, École polytechnique fédérale de Lausanne

Infoscience

  • English
  • French
Log In
  1. Home
  2. Academic and Research Output
  3. Journal articles
  4. Combining thermal scanning probe lithography and dry etching for grayscale nanopattern amplification
 
Loading...
Thumbnail Image
research article

Combining thermal scanning probe lithography and dry etching for grayscale nanopattern amplification

Erbas, Berke  
•
Conde-Rubio, Ana  
•
Liu, Xia  
Show more
February 23, 2024
Microsystems & Nanoengineering

Grayscale structured surfaces with nanometer-scale features are used in a growing number of applications in optics and fluidics. Thermal scanning probe lithography achieves a lateral resolution below 10 nm and a vertical resolution below 1 nm, but its maximum depth in polymers is limited. Here, we present an innovative combination of nanowriting in thermal resist and plasma dry etching with substrate cooling, which achieves up to 10-fold amplification of polymer nanopatterns into SiO2 without proportionally increasing surface roughness. Sinusoidal nanopatterns in SiO2 with 400 nm pitch and 150 nm depth are fabricated free of shape distortion after dry etching. To exemplify the possible applications of the proposed method, grayscale dielectric nanostructures are used for scalable manufacturing through nanoimprint lithography and for strain nanoengineering of 2D materials. Such a method for aspect ratio amplification and smooth grayscale nanopatterning has the potential to find application in the fabrication of photonic and nanoelectronic devices.

  • Details
  • Metrics
Type
research article
DOI
10.1038/s41378-024-00655-y
Web of Science ID

WOS:001168413300001

Author(s)
Erbas, Berke  
•
Conde-Rubio, Ana  
•
Liu, Xia  
•
Pernollet, Joffrey  
•
Wang, Zhenyu  
•
Bertsch, Arnaud  
•
Penedo, Marcos  
•
Fantner, Georg  
•
Banerjee, Mitali  
•
Kis, Andras  
Show more
Date Issued

2024-02-23

Publisher

Springernature

Published in
Microsystems & Nanoengineering
Volume

10

Issue

1

Start page

28

Subjects

Technology

•

Gray-Scale Lithography

•

Fluorocarbon Plasma

•

Monolayer Mos2

•

Surface

•

Redeposition

•

Roughness

•

Sidewalls

•

Products

Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LBNI  
CMI  
FunderGrant Number

Center of Micro/Nanotechnology (CMi) of EPFL

European Research Council (ERC) under the European Union

ERC-2016-ADG

EU

101007417

Show more
Available on Infoscience
March 18, 2024
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/206502
Logo EPFL, École polytechnique fédérale de Lausanne
  • Contact
  • infoscience@epfl.ch

  • Follow us on Facebook
  • Follow us on Instagram
  • Follow us on LinkedIn
  • Follow us on X
  • Follow us on Youtube
AccessibilityLegal noticePrivacy policyCookie settingsEnd User AgreementGet helpFeedback

Infoscience is a service managed and provided by the Library and IT Services of EPFL. © EPFL, tous droits réservés