We report about a new process we have developed to fabricate miniaturized double layer octupoles that can be operated as electrostatic scanner/stigmators for charged particle beams. The fabrication process is based on deep reactive ion etching (DRIE) and anodic bonding. In order to use the octupoles in a microcolumn set-up, they have to be ultra-high vacuum (UHV) compatible. The microfabricated octupoles have been incorporated into our microcolumn test system to investigate the deflection quality on a low energy electron beam. The presented images demonstrate the fully functional operation of a double layer octupole as pre-lens deflector of a microcolumn.