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  4. Mass-Spectrometric Detection of Low-Ppm Contaminants in Sputter Process Systems at 10-2 Mbar, Using a Directly Exposed Ion-Source
 
research article

Mass-Spectrometric Detection of Low-Ppm Contaminants in Sputter Process Systems at 10-2 Mbar, Using a Directly Exposed Ion-Source

Koprio, J.
•
Muralt, P.  
•
Rettinghaus, G.
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1990
Vacuum

Trace contaminants in sputter atmospheres (10(-2) mbar Ar) are determined with a mass spectrometer whose ionizer is directly exposed to the process pressure, whereas the quadrupole filter is kept at high vacuum. The background limitations inherent to conventional differentially pumped analyzers are overcome. Detection limits are 1 ppm for H2O and few ppb for other species.

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Type
research article
DOI
10.1016/0042-207X(90)94191-R
Author(s)
Koprio, J.
Muralt, P.  
Rettinghaus, G.
Strasser, G.
Date Issued

1990

Published in
Vacuum
Volume

41

Issue

7-9

Start page

2106

End page

2108

Note

Koprio, J Balzers Ag,Fl-9496 Balzers,Liechtenstein

Ev616

Cited References Count:3

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LC  
Available on Infoscience
August 21, 2006
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/233212
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