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research article
Mass-Spectrometric Detection of Low-Ppm Contaminants in Sputter Process Systems at 10-2 Mbar, Using a Directly Exposed Ion-Source
1990
Trace contaminants in sputter atmospheres (10(-2) mbar Ar) are determined with a mass spectrometer whose ionizer is directly exposed to the process pressure, whereas the quadrupole filter is kept at high vacuum. The background limitations inherent to conventional differentially pumped analyzers are overcome. Detection limits are 1 ppm for H2O and few ppb for other species.
Type
research article
Authors
Publication date
1990
Published in
Volume
41
Issue
7-9
Start page
2106
End page
2108
Note
Koprio, J Balzers Ag,Fl-9496 Balzers,Liechtenstein
Ev616
Cited References Count:3
Peer reviewed
REVIEWED
EPFL units
Available on Infoscience
August 21, 2006
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